AMAYA - APCVD

Features: Current hot products – AMAX800V (8”) and MAX1200 (12”) AP-CVD equipment; Applicable to different machine models for SiO2, BPSG, BSG, PSG and AlOx films.; Film disposition process can be performed at the temperature ranging from 200°C to 500°C.; Sale of machine parts.; On-site machine repair service.; Machine software/hardware upgrade service.

Atmospheric Chemical Vapor Deposition (AP-CVD) equipment is widely used in semiconductors and solar cells.

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